UMA / PRODUCTS / Lens MTF Tester
DSC-E3MR
1
DSC-E3MR
Lens MTF Tester
DSC-E3MR is one of the extended modules of the DSC-E3 system, which is integrated with the infinity and 10 cm object distance optical system and high precision rotation stage.
The high precision rotation stage is for MTF analysis of a lens in different azimuths, which can be switched to a tray for mass production as usual.
Both single analysis and mass production modes can cooperate with 2 object distances optical systems that can be exchanged automatically.
APPLICATION
Mobile phones, NB, security, AR, VR, TOF, fingerprint, endoscope, and other types of lens.
FEATURES
✔ Automatic object distances switching system between infinity and 10cm for measurement is available.
✔ UMA Patent：DSC-E3MR supports various kinds of reticle patterns, such as Cross Line, on Distortion compensation and MTF measurement without additional reticle and optical information.
As a result, the calibration process and reticle cost can be significantly deducted.
✔ The high precision rotation stage for MTF analysis of a lens in different azimuths is an optional upgrade.
✔ For a user to be able to choose the most suitable focus-scanning mode freely, both free run and trigger run are available.
Lens MTF Tester
DSC-E3MR is one of the extended modules of the DSC-E3 system, which is integrated with the infinity and 10 cm object distance optical system and high precision rotation stage.
The high precision rotation stage is for MTF analysis of a lens in different azimuths, which can be switched to a tray for mass production as usual.
Both single analysis and mass production modes can cooperate with 2 object distances optical systems that can be exchanged automatically.
APPLICATION
Mobile phones, NB, security, AR, VR, TOF, fingerprint, endoscope, and other types of lens.
FEATURES
✔ Automatic object distances switching system between infinity and 10cm for measurement is available.
✔ UMA Patent：DSC-E3MR supports various kinds of reticle patterns, such as Cross Line, on Distortion compensation and MTF measurement without additional reticle and optical information.
As a result, the calibration process and reticle cost can be significantly deducted.
✔ The high precision rotation stage for MTF analysis of a lens in different azimuths is an optional upgrade.
✔ For a user to be able to choose the most suitable focus-scanning mode freely, both free run and trigger run are available.
2
FUNCTIONS
| MTF | |
| DOF | Depth of Focus |
| FBL | Flange Back Focal Length |
| EFL | |
| Through Focus | |
| Focus Tilt | Curvature Height |
| S.F.R. | Spatial Frequency Response |
| Tilt Angle | Optical Axis Tilt & Azimuth |
| Image plane Correction | Simulated Active Alignment |
| Limit Resolution | TV Line=2*LR*Sensor Size |
| C.R.A. | Chief Ray Angle |
| Encircle Energy | |
| FOV | (UMA Patent) |
| Optical Distortion |
3
SPECIFICATIONS
| Machine Dimensions | 152cm *86cm *170cm |
| Machine Weight | 350 Kg |
| Power Supply | AC220V/10A |
| IPC Operation system | Microsoft Windows 10 |
| Reticle Pattern – 3 types (Optional) | A：Edge (ISO 12233) + Grid B：Cross Line + Grid C：Cross Line |
| MTF Repeatability (10pcs sample、tray in/out 5 times、excluding load & unload) |
Delta MTF : (≤ 200lp/mm) On axis ≤ 1.0 ; off axis ≤ 2.0 |
| Average test times/pc H/W trigger Mode (without tray load and unload) |
1.5s/pc (M6 Lens、through focus range +/-0.04) 8ses（Automatic object distances switching between infinity and 10cm） (The Object distance will be switched automatically after the tests of all rotation angles and samples are completed.) |
| Maximum Measuring Frequency | 500lp/mm |
| Limited FBL | > -3.0mm |
| Reticle Size Limited | Max.12mm*12mm ( >12mm customized) Min.1.6mm*1.6mm |
| LED Light Source | Visible : Photopic NIR : 850nm or 940nm (Optional) |